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Canon is Developing Semiconductor Lithography Equipment Employing Nanoimprint Technology

Art Post · 2/23/1510:26 PM

MELVILLE, N.Y. — Canon U.S.A. Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., is developing a next-generation semiconductor lithography system employing nanoimprint technology that makes possible sub-20 nm 1 high-resolution processes. Within the leading-edge high-resolution patterning segment, where 193 nm multiple patterning has become mainstream and EUV (extreme ultraviolet) 2 continues to remain in development, in 2004, Canon began...

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Canon is Developing Semiconductor Lithography Equipment Employing Nanoimprint Technology

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